ASNIL 2009 provides scientists, engineers and researchers with opportunities to share research activities,information,and achievements in Nano Imprint Lithography. The symposium consists of plenary talks, invited talks, and oral/poster presentations.
Exhibitions from nano science and related industries will also be featured from Wednesday to Friday at the Taipei World Trade Center. We look forward to seeing you at the upcoming Forum. 

 

NEW ★ Author's Kit for Accepted Papers Detail
★ Advance Program PDF
★ Session Navigator & Time Table PDF
★ On-line Registration Detail